One of the core challenges that Rapidus will face when it kicks off volume production of chips on its 2nm-class process technology in 2027 is lining up customers. With Intel, Samsung, and TSMC all slated to offer their own 2nm-class nodes by that time, Rapidus will need some kind of advantage to attract customers away from its more established rivals. To that end, the company thinks they've found their edge: fully automated packaging that will allow for shorter chip lead times than manned packaging operations.

In an interview with Nikkei, Rapidus' president, Atsuyoshi Koike, outlined the company's vision to use advanced packaging as a competitive edge for the new fab. The Hokkaido facility, which is currently under construction and is expecting to begin equipment installation this December, is already slated to both produce chips and offer advanced packaging services within the same facility, an industry first. But ultimately, Rapidus biggest plan to differentiate itself is by automating the back-end fab processes (chip packaging) to provide significantly faster turnaround times.

Rapidus is targetting back-end production in particular as, compared to front-end (lithography) production, back-end production still heavily relies on human labor. No other advanced packaging fab has fully automated the process thus far, which provides for a degree of flexibility, but slows throughput. But with automation in place to handle this aspect of chip production, Rapidus would be able to increase chip packaging efficiency and speed, which is crucial as chip assembly tasks become more complex. Rapidus is also collaborating with multiple Japanese suppliers to source materials for back-end production. 

"In the past, Japanese chipmakers tried to keep their technology development exclusively in-house, which pushed up development costs and made them less competitive," Koike told Nikkei. "[Rapidus plans to] open up technology that should be standardized, bringing down costs, while handling important technology in-house." 

Financially, Rapidus faces a significant challenge, needing a total of ¥5 trillion ($35 billion) by the time mass production starts in 2027. The company estimates that ¥2 trillion will be required by 2025 for prototype production. While the Japanese government has provided ¥920 billion in aid, Rapidus still needs to secure substantial funding from private investors.

Due to its lack of track record and experience of chip production as. well as limited visibility for success, Rapidus is finding it difficult to attract private financing. The company is in discussions with the government to make it easier to raise capital, including potential loan guarantees, and is hopeful that new legislation will assist in this effort.

Under the CHIPS & Science Act, the U.S. government provided tens of billions of dollars in grants and loans to the world's leading maker of chips, such as Intel, Samsung, and TSMC, which will significantly expand the country's semiconductor production industry in the coming years. However, most chips are typically tested, assembled, and packaged in Asia, which has left the American supply chain incomplete. Addressing this last gap in the government's domestic chip production plans, these past couple of weeks the U.S. government signed memorandums of understanding worth about $1.5 billion with Amkor and SK hynix to support their efforts to build chip packaging facilities in the U.S.

Amkor to Build Advanced Packaging Facility with Apple in Mind

Amkor plans to build a $2 billion advanced packaging facility near Peoria, Arizona, to test and assemble chips produced by TSMC at its Fab 21 near Phoenix, Arizona. The company signed a MOU that offers $400 million in direct funding and access to $200 million in loans under the CHIPS & Science Act. In addition, the company plans to take advantage of a 25% investment tax credit on eligible capital expenditures.

Set to be strategically positioned near TSMC's upcoming Fab 21 complex in Arizona, Amkor's Peoria facility will occupy 55 acres and, when fully completed, will feature over 500,000 square feet (46,451 square meters) of cleanroom space, more than twice the size of Amkor's advanced packaging site in Vietnam. Although the company has not disclosed the exact capacity or the specific technologies the facility will support, it is expected to cater to a wide range of industries, including automotive, high-performance computing, and mobile technologies. This suggests the new plant will offer diverse packaging solutions, including traditional, 2.5D, and 3D technologies.

Amkor has collaborated extensively with Apple on the vision and initial setup of the Peoria facility, as Apple is slated to be the facility's first and largest customer, marking a significant commitment from the tech giant. This partnership highlights the importance of the new facility in reinforcing the U.S. semiconductor supply chain and positioning Amkor as a key partner for companies relying on TSMC's manufacturing capabilities. The project is expected to generate around 2,000 jobs and is scheduled to begin operations in 2027. 

SK hynix to Build HBM4 in the U.S.

This week SK hynix also signed a preliminary agreement with the U.S. government to receive up to $450 million in direct funding and $500 million in loans to build an advanced memory packaging facility in West Lafayette, Indiana. 

The proposed facility is scheduled to begin operations in 2028, which means that it will assemble HBM4 or HBM4E memory. Meanwhile, DRAM devices for high bandwidth memory (HBM) stacks will still be produced in South Korea. Nonetheless, packing finished HBM4/HBM4E in the U.S. and possibly integrating these memory modules with high-end processors is a big deal.

In addition to building its packaging plant, SK hynix plans to collaborate with Purdue University and other local research institutions to advance semiconductor technology and packaging innovations. This partnership is intended to bolster research and development in the region, positioning the facility as a hub for AI technology and skilled employment.

Sources: Amkor, SK hynix

Imec and ASML have announced that the two companies have printed the first logic and DRAM patterns using ASML's experimental Twinscan EXE:5000 EUV lithography tool, the industry's first High-NA EUV scanner. The lithography system achieved resolution that is good enough for 1.4nm-class process technology with just one exposure, which confirms the capabilities of the system and that development of the High-NA ecosystem remains on-track for use in commercial chip production later this decade.

"The results confirm the long-predicted resolution capability of High NA EUV lithography, targeting sub 20nm pitch metal layers in one single exposure," said Luc Van den hove, president and CEO of imec. "High NA EUV will therefore be highly instrumental to continue the dimensional scaling of logic and memory technologies, one of the key pillars to push the roadmaps deep into the ‘angstrom era'. These early demonstrations were only possible thanks to the set-up of the joint ASML-imec lab allowing our partners to accelerate the introduction of High NA lithography into manufacturing."

The successful test printing comes after ASML and Imec have spent the last several months laying the groundwork for the test. Besides the years required to build the complex scanner itself, engineers from ASML, Imec, and their partners needed to develop newer photoresists, underlayers, and reticles. Then they had to take an existing production node and tune it for High-NA EUV tools, including doing optical proximity correction (OPC) and tuning etching processes.

The culmination of these efforts was that, using ASML's pre-production Twinscan EXE:5000 system, Imec was able to successfully pattern random logic structures with 9.5nm dense metal lines, which corresponds to a 19nm pitch and sub-20nm tip-to-tip dimensions. Similarly, Imec also set new high marks in feature density in other respects, including patterning of 2D features at a 22nm pitch, and printing random vias with a 30nm center-to-center distance, demonstrating high pattern fidelity and critical dimension uniformity.

The overall result is that Imec's experiments have proven that ASML's High-NA scanner is delivering on its intended capabilities, printing features at a fine enough resolution for fabricating logic on a 1.4nm-class process technology – and all with a single exposure. The latter is perhaps the most important aspect of this tooling, as the high cost and complexity of the High-NA tool itself (said to be around $400 million) is intended to be offset by being able to return to single-patterning, which allows for higher tool productivity and fewer steps overall.

Imec hasn't just been printing logic structures, either; the group successfully patterned DRAM designs as well, printing both a storage node landing pad alongside the bit line periphery for memory in a single exposure. As with their logic tests, this would allow DRAM designs to be printed in just one exposure, reducing cycle times and eventually costs.

9,5nm random logic structure (19nm pitch) after pattern transfer

Gallery: imec High-NA Pattern Samples

"We are thrilled to demonstrate the world's first High NA-enabled logic and memory patterning in the joint ASML-imec lab as an initial validation of industry applications," said Steven Scheer, senior vice president of compute technologies & systems/compute system scaling at imec. "The results showcase the unique potential for High NA EUV to enable single-print imaging of aggressively-scaled 2D features, improving design flexibility as well as reducing patterning cost and complexity. Looking ahead, we expect to provide valuable insights to our patterning ecosystem partners, supporting them in further maturing High NA EUV specific materials and equipment."